What does EUVL mean?

Extreme Ultraviolet Lithography (EUVL) is an advanced semiconductor manufacturing technology used in the production of Integrated Circuits (IC). EUVL is a type of photolithography that uses Extreme Ultraviolet (EUV) light with wavelengths in the range of 13.5 nanometers (nm) to create intricate patterns on silicon wafers.

Note:
EUV has a much shorter wavelength compared to the ultraviolet light used in previous lithography technologies. The shorter wavelength enables higher precision in etching smaller features on the silicon wafer.

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