MPW

Access our dispersion-engineered SiN platform through cost-effective MPW runs

E-beam lithography enables maskless prototyping with the precision needed for demanding applications and fast iteration cycles to get your designs to the lab sooner.

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Our platform

  • 750 nm thick SiN optimized for dispersion control demanding applications
  • Ultra-low propagation loss
  • E-beam lithography enabling maskless prototyping with high design flexibility
  • Accelerated turnaround times for rapid design iteration
  • Seamless integration with Luceda IPKISS for design via our measurement-validated PDK

MPW Schedule

MPW type

Lock-in date

Design submission date

Typical delivery date

Status

PDK version

750 nm SiN (Solinide_750)

February 27th 2026

March 27th 2026

July 27th 2026

Open

1.0

750 nm SiN (Solinide_750)

TBD

TBD

TBD

Upcoming

TBD

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