Access our dispersion-engineered SiN platform through cost-effective MPW runs
E-beam lithography enables maskless prototyping with the precision needed for demanding applications and fast iteration cycles to get your designs to the lab sooner.
Our platform
MPW Schedule
|
MPW type 211_90dd67-77> |
MPW name 211_865981-bb> |
PO submission deadline 211_9c0b21-f9> |
Design submission deadline 211_1dd3ec-85> |
Preliminary delivery date 211_52cfc4-92> |
Status 211_7906f5-f2> |
PDK version 211_b122bc-9e> |
|---|---|---|---|---|---|---|
|
750 nm SiN 211_24248d-41> |
MPW1 211_2835e5-50> |
27 Feb 2026 211_dde266-0f> |
27 Mar 2026 211_f063ad-60> |
27 Jul 2026 211_f4c2bc-5b> |
Closed 211_71901d-18> |
1.0 211_ef29aa-03> |
|
750 nm SiN 211_46c9c5-7d> |
MPW2 211_650468-ee> |
29 May 2026 211_e38a0a-d0> |
29 Jun 2026 211_43566b-23> |
29 Oct 2026 211_cae69d-4d> |
Open 211_ced98f-2e> |
1.0 211_d09931-9b> |
|
750 nm SiN 211_279454-4c> |
MPW3 211_5f25ae-c9> |
28 Aug 2026 211_829319-6f> |
28 Sep 2026 211_c46629-61> |
28 Jan 2027 211_d49c7e-15> |
Open 211_d1d228-f4> |
TBD 211_598b7b-93> |
|
750 nm SiN 211_4769dd-5f> |
MPW4 211_b1ec06-26> |
14 Dec 2026 211_3a4b87-81> |
22 Jan 2027 211_ffb860-8d> |
22 May 2027 211_0447b8-95> |
Open 211_1c0b0d-65> |
TBD 211_6d5b98-92> |

