MPW

Access our dispersion-engineered SiN platform through cost-effective MPW runs


E-beam lithography enables maskless prototyping with the precision needed for demanding applications and fast iteration cycles to get your designs to the lab sooner.

Our platform


  • 750 nm thick SiN optimized for dispersion control demanding applications
  • Ultra-low propagation loss
  • E-beam lithography enabling maskless prototyping with high design flexibility
  • Accelerated turnaround times for rapid design iteration
  • Seamless integration with Luceda IPKISS for design via our measurement-validated PDK

MPW Schedule

MPW type

MPW name

PO submission deadline

Design submission deadline

Preliminary delivery date

Status

PDK version

750 nm SiN

MPW1

27 Feb 2026

27 Mar 2026

27 Jul 2026

Closed

1.0

750 nm SiN

MPW2

29 May 2026

29 Jun 2026

29 Oct 2026

Open

1.0

750 nm SiN

MPW3

28 Aug 2026

28 Sep 2026

28 Jan 2027

Open

TBD

750 nm SiN

MPW4

14 Dec 2026

22 Jan 2027

22 May 2027

Open

TBD

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